Can one system handle both disinfection and chloramine/chlorine reduction?
Yes. HOD UV reactors can perform both tasks, though chloramine/chlorine reduction requires higher doses (hundreds of mJ/cm² versus tens for microbes)
Yes. HOD UV reactors can perform both tasks, though chloramine/chlorine reduction requires higher doses (hundreds of mJ/cm² versus tens for microbes)
HOD UV allows to avoid chemical handling, reduces waste, reacts instantly, results in superior disinfection performance and protects downstream membranes without generating residuals or needing regeneration.
RO membrane protection, as well as chlorine removal before sensitive equipment such as EDI, resins etc. In industrial and municipal systems, food & beverage, pharma & microelectronics water polishing. Aquatic facilities (to reduce trichloramine odor and irritation), e.g swimming pools.
HOD UV technology typically offers highly competitive operational costs, especially when compared to chemical-based disinfection or conventional UV systems. A detailed cost-benefit analysis for specific municipal plants requires additional information about flow rates and specific treatment
HOD UV technology can be combined with Advanced Oxidation Processes (AOP) to manage high organic loads effectively. This combination ensures the degradation and removal of complex organic compounds, maintaining compliance with stringent regulatory standards.
HOD UV technology can significantly reduce or, in certain regulatory environments, completely replace chlorine for primary disinfection. However, regulatory standards in many regions, including Mexico, often require residual chlorine presence in distribution networks to maintain microbiological safety post-treatment.
Advanced Oxidation Processes (AOP) effectively remove challenging contaminants such as: Pharmaceutical residues Personal care products Endocrine disruptors Certain pesticides Taste and odor-causing compounds Specific persistent organic pollutants For contaminants like PFAS, Atlantium is actively developing and applying solutions demonstrating significant removal through ARP.